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Handbook of Chemicals & Gases for the Semi- Conductor Industry download ebook

by Ashutosh Misra,Jeremiah D. Hogan,Russell Chorush

Handbook of Chemicals & Gases for the Semi- Conductor Industry download ebook
ISBN:
0471316717
ISBN13:
978-0471316718
Author:
Ashutosh Misra,Jeremiah D. Hogan,Russell Chorush
Publisher:
Wiley-Interscience; 1 edition (March 2002)
Language:
Pages:
363 pages
ePUB:
1282 kb
Fb2:
1465 kb
Other formats:
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Category:
Engineering
Subcategory:
Rating:
4.8

Ashutosh Misra, Jeremiah D. Hogan, Russell A. Chorush.

Ashutosh Misra, Jeremiah D. The first comprehensive guide to the chemicals and gases used in semiconductor manufacturing The fabrication of semiconductor devices involves a series of complex chemical processes such as photolithography, etching, cleaning, thin film deposition, and polishing. Until now, there has been no convenient source of information on the properties, applications, and health and safety considerations of the chemicals used in these processes. The Handbook of Chemicals and Gases for the Semiconductor Industry meets this need.

The first comprehensive guide to the chemicals and gases used in semiconductor manufacturing The fabrication of semiconductor devices involves a. .Ashutosh Misra, Jeremiah D.

The first comprehensive guide to the chemicals and gases used in semiconductor manufacturing The fabrication of semiconductor devices involves a series of complex chemical processes such as photolithography, etching, cleaning, thin film deposition, and polishing. ISBN: 978-0-471-31671-8 April 2002 363 Pages.

Автор: Ashutosh Misra Название: Handbook of Chemicals and Gases for the .

Each of the Handbooks eight chapters is related to a specific area of semiconductor processing.

Handbook of Chemicals & Gases for the Semi Conductor Industry.

Chemical vapor deposition (CVD): This is a process where one or more volatile inorganic, metal-organic, or organometallic precursors are transported in the vapor phase, often in a carrier gas, to the reactor chamber where they decompose on a heated substrate and subsequently deposit a solid film along with volatile byproducts.

In book: Handbook of Chemicals and Gases for the Semiconductor . This structure has been used to make capacitors and metal oxide semiconductor field effect transistors.

In book: Handbook of Chemicals and Gases for the Semiconductor Industry. Cite this publication. Hospital Privado de Comunidad. The interface trap density between the SrTiO3 and the Si is . 1010 states/cm2 eV and the inversion layer mobility is 221 and 62 cm2/V s for n- and p-channel devices, respectively.

Misra, Ashutosh Hogan, Jeremiah D. and Chorush, Russell 2002. Handbook of Chemicals and Gases for the Semiconductor Industry. 1. ohammed, M. Naik, . Mantese, J. Schubring, N. Micheli, A. and Catalan, A. J. Mater. Three industry standard test methods were used to determine the outgassing, leaching, and extraction. parameters, defined in combination as the process compatibility parameters. To supplement them, the presence of critical elements at the surface of the materials and the condition of the surface were examined before and after exposure to water and chemicals. and Chorush, Russell 2002

Misra, Ashutosh Hogan, Jeremiah D. Google Scholar Citations. View all Google Scholar citations for this article. For the next generation of integrated microcircuits, there exists a need in the electronics industry for high conductivity, electromigration resistant metallization that can be deposited selectivity by chemical vapor deposition techniques. This paper describes a new process for depositing copper/aluminum metallization selectively onto diffusion barrier surfaces in two consecutive steps.

The first comprehensive guide to the chemicals and gases used in semiconductor manufacturing

The fabrication of semiconductor devices involves a series of complex chemical processes such as photolithography, etching, cleaning, thin film deposition, and polishing. Until now, there has been no convenient source of information on the properties, applications, and health and safety considerations of the chemicals used in these processes. The Handbook of Chemicals and Gases for the Semiconductor Industry meets this need.

Each of the Handbook's eight chapters is related to a specific area of semiconductor processing. The authors provide a brief overview of each step in the process, followed by tables containing physical properties, handling, safety, and other pertinent information on chemicals and gases typically used in these processes. The 270 chemical and gas entries include data on physical properties, emergency treatment procedures, waste disposal, and incompatible materials, as well as descriptions of applications, chemical mechanisms involved, and references to the literature. Appendices cross-reference entries by process, chemical name, and CAS number.

The Handbook's eight chapters are:Thin Film Deposition MaterialsWafer Cleaning MaterialsPhotolithography MaterialsWet and Dry Etching MaterialsChemical Mechanical Planarizing MethodsCarrier GasesUncategorized MaterialsSemiconductor Chemicals Analysis

No other single source brings together these useful and important data on chemicals and gases used in the manufacture of semiconductor devices. The Handbook of Chemicals and Gases for the Semiconductor Industry will be a valuable reference for process engineers, scientists, suppliers to the semiconductor industry, microelectronics researchers, and students.